#359 Me refería al ancho de la Gate del transistor, aunque luego he visto que hace años ya que no tiene nada que ver con el tamaño del "nodo" que llevan tiempo usando en términos de márketing.
En su día estaba relacionado:
The active part of the transistor channel — the part that forms a barrier when the transistor is "off", or conducts when the transistor is "on" — is the area formed by the intersection of the diffusion in the first step and the gate metal in the last step. The electrons (in an N-channel device) flow from source to drain. The length of this channel (from the electrons' point of view) is the same as the width of the gate "line" that was drawn in the metal layer. The width of the channel is the same as the width of the original diffusion.
One of the fundamental limitations of any given IC "process" is how narrow the gate lines in the metal layer can be. In fact, this parameter is so important that this measurement is often the "name" of the process. When you read about the latest CPU being done in, say, a "32 nm process", this means that the minimum gate width (channel length) in this process is 32 nanometers.
